Products:
Diffraction Gratings
LightSmyth Technologies introduces a new family of diffraction gratings based on DUV photolithographic ruling in the first major advance in grating fabrication technique in decades. For the first time, the nanoscale patterning power of photoreduction lithography is harnessed to produce diffraction gratings with standard constant pitch configurations or with arbitrary line spacing and curvature. Gratings are available bare or with a variety of surface metallizations (e.g. aluminum, gold, silver, etc.) to provide high diffractive efficiency.
LightSmyth is also introducing several lines of monolithic grating arrays wherein multiple gratings with different periods and/or orientations are fabricated coherently on a single substrate. When combined with 2D detectors, LightSmyth grating arrays provide access to wide spectral bandwidths at ultra-high resolution. Grating arrays also provide for the powerful and temperature-independent calibration of a primary grating's output via optical markers produced by a family of small coherent secondary gratings all integrated with the primary grating(s) on a single monolithic substrate.
LightSmyth lithographic diffraction gratings feature diffraction efficiencies comparable to traditional holographic and ruled gratings but substantially outperform these by providing up to two order of magnitude lower scattered light levels – thereby providing excellent signal detectability. Gratings are available with silicon, fused silica, glass, or plastic substrates. Silicon grating substrates provide thermal conductivity approaching that of copper and lower thermal expansion than pyrex, making it an ideal substrate for high temperature or power applications. Gratings can have substrate thicknesses as thin as 700 microns providing for ultra-light and ultra-small construction. Sub-mm substrate thickness makes gratings ultra-light and enables device miniaturization.
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